The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Oct. 29, 2004
Robert M. Bigwood, Hillsboro, OR (US);
Shem Ogadhoh, Beaverton, OR (US);
Joseph E. Brandenburg, Portland, OR (US);
Robert M. Bigwood, Hillsboro, OR (US);
Shem Ogadhoh, Beaverton, OR (US);
Joseph E. Brandenburg, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A correction for photolithography masks used in semiconductor and micro electromechanical systems is described. The correction is based on process windows. In one example, the invention includes evaluating a segment of an idealized photolithography mask at a plurality of different possible process variable values to estimate a corresponding plurality of different photoresist edge positions, comparing the estimated edge positions to a minimum critical dimension, and moving the segment on the idealized photolithography mask if the estimated edge positions do not satisfy the minimum critical dimension.