Joseph Barraco

Title: Joseph Barraco: Innovator in Ion Beam Technology

Introduction

Joseph Barraco is a notable inventor based in Lutz, Florida. He has made significant contributions to the field of ion beam technology, particularly in enhancing the life of deposition targets used in sputtering systems. His innovative approach has led to advancements that improve target utilization, making processes more efficient.

Latest Patents

Joseph Barraco holds a patent for "Ion beam deposition target life enhancement." This patent outlines a method for increasing target utilization within a sputtering system. The process involves a plurality of targets that are operatively connected to a central axis. An ion beam is generated within the sputtering system and directed at specific locations on the targets for designated time periods. This method allows for the rotation of the targets, optimizing their usage and extending their lifespan.

Career Highlights

Joseph Barraco is associated with Plasma-Therm NES LLC, a company known for its innovative solutions in the field of semiconductor manufacturing. His work at Plasma-Therm has positioned him as a key player in advancing ion beam technology.

Collaborations

Joseph has collaborated with talented individuals such as Sarpangala Hariharakeshava Hegde and Vincent Lee. Their combined expertise contributes to the innovative environment at Plasma-Therm.

Conclusion

Joseph Barraco's contributions to ion beam technology exemplify the spirit of innovation in the field. His patent and work at Plasma-Therm highlight the importance of advancements in target utilization, paving the way for more efficient manufacturing processes.