Josef Lang

Title: Josef Lang: Innovator in Semiconductor Polishing Technologies

Introduction

Josef Lang is a notable inventor based in Burghausen, Germany. He has made significant contributions to the field of semiconductor polishing technologies. With a total of 2 patents, his work focuses on improving the efficiency and effectiveness of polishing processes used in semiconductor manufacturing.

Latest Patents

One of his latest patents is a process for treating polishing cloths used for semiconductor wafers. In the chemo-mechanical polishing of semiconductor wafers, the abrasion and geometrical quality of the wafers decrease with the increasing service life of the polishing cloth. This issue can be mitigated by treating the polishing cloth after each polishing operation. The treatment involves impressing a pressure field on the polishing cloth, which allows a treatment liquid to flow through its interior. This process renders the residues produced during polishing mobile and facilitates their removal. A baseplate placed transversely across the polishing cloth, equipped with exit openings for the treatment liquid, is suitable for carrying out this process.

Another significant patent by Lang is related to a process and apparatus for double-sided chemomechanical polishing of semiconductor wafers. This innovation allows for the fabrication of silicon wafers with high geometrical quality by employing differently polarized front and rear sides during the polishing process. An electric field is established between the upper and lower polishing plates, which enhances the polishing efficiency. This is achieved by incorporating a thin conductive layer between the upper polishing plate and the polishing cloth, allowing a voltage to be impressed while grounding both polishing plates to the frame.

Career Highlights

Josef Lang is associated with Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, where he applies his expertise in semiconductor technologies. His innovative approaches have contributed to advancements in the industry, particularly in the area of polishing processes.

Collaborations

Lang collaborates with Helene Prigge, who is also involved in the field of semiconductor technologies. Their partnership has fostered the development of new ideas and solutions in the industry.

Conclusion

Josef Lang's contributions to semiconductor polishing technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the industry and provide effective solutions to enhance the quality of semiconductor wafers.