Josef Heindel

Title: The Innovative Contributions of Josef Heindel

Introduction

Josef Heindel is a notable inventor based in Hainburg, Germany. He has made significant contributions to the field of sputtering technology, holding a total of 3 patents. His work has been instrumental in advancing materials used in various applications.

Latest Patents

One of his latest patents is for a tube-shaped sputtering target. This invention features a carrier tube with an indium-based sputtering material arranged on it. The sputtering material is designed with a microstructure that has a mean grain size of less than 1 mm, measured as the mean diameter of the grains on the sputtering-roughened surface. Another significant patent involves magnetic shunts in tubular targets. This patent describes a sputter target that includes a carrier body and a target material, with a ferromagnetic material arranged between the front surface of the target material and the rear surface of the carrier body.

Career Highlights

Throughout his career, Josef Heindel has worked with prominent companies such as Heraeus Deutschland GmbH & Co. KG and W.C. Heraeus GmbH. His experience in these organizations has allowed him to refine his expertise in sputtering technology and materials science.

Collaborations

Josef has collaborated with several professionals in his field, including Martin Schlott and Christoph Simons. These collaborations have contributed to the development of innovative solutions in sputtering technology.

Conclusion

Josef Heindel's contributions to sputtering technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in materials science and engineering.