Heraeus Deutschland Gmbh & Co Kg

W.c. Heraeus Gmbh

Leybold Materials Gmbh

Materion Advanced Materials Germany Gmbh

Josef Heindel

Martin Schlott

Christoph Simons

Norbert Wollenberg

Christoph Stahr

Carl Christoph Stahr

Hans-Joachim Pavel

Helmut Luh

Carl-Christoph Stahr

A tube-shaped sputtering target is provided having a carrier tube and an indium-based sputtering material arranged on the carrier tube. The sputtering material has a microstructure having a mean grain size of less than 1 mm, measured as the mean diameter of the grains on the sputtering-roughened surface of the sputtering material.

Tube-shaped sputtering target

A sputter target has a carrier body and a target material arranged on the carrier body, wherein the carrier body has a rear surface facing away from the target material and the target material has a front surface facing away from the carrier body. A ferromagnetic material is arranged between the front surface and the rear surface.

Magnetic shunts in tubular targets

A cobalt based alloy having a chromium content in the range of 18-21% permits a high degree of magnetic field penetration which is comparable to non-ferromagnetic alloys. The alloy preferably contains 8-18% Pt and optionally may contain small amounts of Mo, Pd, Ni, Ti, V, Ta, W, and B.

Cobalt base alloy sputtering target with high magnetic field penetration

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Hainburg, Germany

Josef Heindel