Jose J Garcia

Title: Innovations of Jose J Garcia

Introduction

Jose J Garcia is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of lithography through his innovative patent. His work is particularly relevant in the context of semiconductor manufacturing, where precision is crucial.

Latest Patents

Jose J Garcia holds a patent for a focus detection structure. This patent describes a mask or reticle that includes a focus test area featuring a pattern of opaque lines, naked lines, and phase-shifting lines. The resulting pattern on a wafer exposed through this focus test area may exhibit a first area of the pattern shifted concerning a second area if the lithography system is out of focus. In certain implementations, an area of the pattern may contract or expand if the lithography system is not properly focused. The determination of an out-of-focus condition can be achieved using a registration tool, scanning electron microscope (SEM), or an interferometer tool (OCD). Furthermore, the out-of-focus condition can be improved using the information gathered from these tools.

Career Highlights

Jose J Garcia is currently employed at Intel Corporation, a leading company in semiconductor technology. His role at Intel allows him to work on cutting-edge innovations that drive the industry forward. With his expertise, he contributes to the development of advanced lithography techniques that enhance manufacturing processes.

Collaborations

One of his notable coworkers is Sven Eric Henrichs. Their collaboration exemplifies the teamwork necessary for driving innovation in the highly competitive field of technology.

Conclusion

Jose J Garcia's contributions to the field of lithography through his patent on focus detection structures highlight his role as a significant inventor in the semiconductor industry. His work at Intel Corporation continues to influence advancements in technology.