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For the Inventor, By the Inventor

Seongnam-si, South Korea

Joon-Soo Park

USPTO Granted Patents = 15 

Average Co-Inventor Count = 2.3

ph-index = 7

Forward Citations = 136(Granted Patents)


Location History:

  • Suwon, KR (2003)
  • Gyeonggi-do, KR (2009 - 2011)
  • Seongnam-si, KR (2008 - 2014)

Company Filing History:

goldMedal15 out of 131,611 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2003-2014

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15 patents (USPTO):Explore Patents
1. 8785319 - Methods for forming fine patterns of a semiconductor device (2014-07-22),
2. 8614148 - Methods for forming fine patterns of a semiconductor device (2013-12-24),
3. 8278221 - Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same (2012-10-02),
4. 8062981 - Method of forming pattern using fine pitch hard mask (2011-11-22),
5. 8034684 - Semiconductor device with improved overlay margin and method of manufacturing the same (2011-10-11),
6. 8003543 - Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same (2011-08-23),
7. 7879726 - Methods of forming semiconductor devices using selective etching of an active region through a hardmask (2011-02-01),
8. 7842601 - Method of forming small pitch pattern using double spacers (2010-11-30),
9. 7732341 - Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same (2010-06-08),
10. 7732279 - Semiconductor device with improved overlay margin and method of manufacturing the same (2010-06-08),
11. 7550383 - Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same (2009-06-23),
12. 7518704 - Multiple exposure apparatus and multiple exposure method using the same (2009-04-14),
13. 7473647 - Method of forming pattern using fine pitch hard mask (2009-01-06),
14. 7414279 - Semiconductor device with improved overlay margin and method of manufacturing the same (2008-08-19),
15. 6522351 - Stereoscopic image display apparatus using a single projector (2003-02-18),

Title: The Innovative Mind of Joon-Soo Park

Introduction

Joon-Soo Park is a prominent inventor based in Seongnam-si, South Korea. With a remarkable portfolio of 15 patents, Park specializes in advancements in semiconductor technology. His work has contributed significantly to the field, showcasing his ingenuity and dedication to innovation.

Latest Patents

Among his latest patents are methods for forming fine patterns of a semiconductor device. These methods include the creation of first hard mask patterns that extend in a first direction on a lower layer, followed by the formation of second hard mask patterns that fill the gaps between the first. Park's innovative processes involve etching techniques that utilize mask patterns to create openings in a precise manner, allowing for greater accuracy in semiconductor fabrication. His techniques ensure that the second openings are spaced apart from the first in a diagonal direction, enhancing the overall efficiency of the semiconductor manufacturing process.

Career Highlights

Joon-Soo Park's career is marked by his role at Samsung Electronics Co., Ltd., where he has made substantial contributions to the field of semiconductor design and manufacturing. His innovative approaches to fine pattern formation have positioned him as a leader in semiconductor technology, driving advancements that improve efficiency and performance in electronic devices.

Collaborations

During his professional journey, Park has collaborated with talented individuals such as Ji-young Lee and Gi-Sung Yeo. Together, they have worked on various projects that have pushed the boundaries of semiconductor innovation, leveraging each other's expertise to produce groundbreaking results.

Conclusion

Joon-Soo Park exemplifies the spirit of innovation in the field of semiconductor technology. His extensive patent portfolio and collaborative efforts highlight his commitment to advancing the industry. As he continues to develop new methods and techniques, Park's contributions will undoubtedly shape the future of semiconductor devices.

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