The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Jan. 13, 2006
Sang-jin Kim, Suwon-si, KR;
Gi-sung Yeo, Seoul, KR;
Joon-soo Park, Seongnam-si, KR;
Byeong-soo Kim, Suwon-si, KR;
Sang-jin Kim, Suwon-si, KR;
Gi-sung Yeo, Seoul, KR;
Joon-soo Park, Seongnam-si, KR;
Byeong-soo Kim, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A multiple exposure system and a multiple exposure method using the same enhance the resolution of the image of the mask pattern transferred to a substrate. The system includes NA controllers that provide excellent resolution with respect to the directions of the short axis and long axis of the mask pattern. In one form of the method, a first exposure process is performed using a first NA controller that provides excellent resolution with respect to the direction of the short axis of the mask pattern and subsequently, a second exposure process is performed using a second NA controller that provides excellent resolution with respect to the direction of the long axis of the mask pattern. Alternatively, the first exposure process and the second or high order exposure process can be sequentially performed using the first and second NA controllers simultaneously.