Company Filing History:
Years Active: 2018-2020
Title: Innovations by Jong Wan Choi
Introduction
Jong Wan Choi is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His work focuses on improving manufacturing processes, particularly in the semiconductor industry.
Latest Patents
One of Jong Wan Choi's latest patents is a method of processing a substrate that prevents over-etching of a staircase structure due to an etching solution. This innovative substrate processing method involves alternately stacking a first insulating layer and a second insulating layer. It includes forming a stepped structure with an upper surface, a lower surface, and a side surface by etching the stacked layers. The method also emphasizes densifying the stepped structure and forming a barrier layer on the densified second insulating layer. During the isotropic etching step, the second insulating layer remains largely unaffected, ensuring precision in the manufacturing process.
Another significant patent by Choi is a method of processing a substrate that omits the photolithographic process. This method involves forming at least one layer on a stepped structure and selectively densifying portions of the layer via asymmetric plasma application. The isotropic etching process separates the portions of the layer formed on the upper and lower surfaces, enhancing efficiency in substrate processing.
Career Highlights
Jong Wan Choi is currently associated with Asm IP Holding B.V., where he continues to innovate in substrate processing technologies. His expertise in this area has led to advancements that benefit the semiconductor manufacturing industry.
Collaborations
Choi has collaborated with notable coworkers, including Yong Min Yoo and Young Jae Kim. Their combined efforts contribute to the development of cutting-edge technologies in substrate processing.
Conclusion
Jong Wan Choi's contributions to substrate processing through his innovative patents demonstrate his significant impact on the semiconductor industry. His work continues to pave the way for advancements in manufacturing processes.
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