Hwaseong-si, South Korea

Jong-Sun Ahn

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.9

ph-index = 1

Forward Citations = 19(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2007)
  • Hwaseong-si, KR (2014)

Company Filing History:


Years Active: 2007-2014

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4 patents (USPTO):Explore Patents

Title: Innovations by Jong-Sun Ahn: Pioneering Chemical Mechanical Polishing Technologies

Introduction: Jong-Sun Ahn is an accomplished inventor based in Hwaseong-si, South Korea. With a total of four patents to his name, he has significantly contributed to the field of chemical mechanical polishing. His innovative approaches are paving the way for advancements in semiconductor manufacturing processes.

Latest Patents: Among his latest patents, Ahn has developed a chemical mechanical polishing apparatus. This apparatus features a platen with a designated first region for wafer support and a second region positioned outside this support area. It includes a polishing pad, a pad head, and a slurry supply that effectively delivers slurry to the wafer. Notably, there is an injection port in the second region designed to inject a predetermined gas towards the wafer's edge, enhancing the polishing process.

Additionally, Ahn has patented a polishing pad specifically for the chemical mechanical polishing process, which includes a unique body design featuring a rotational symmetric groove pattern. This innovation is pivotal in improving the efficiency and effectiveness of the polishing process.

Career Highlights: Jong-Sun Ahn is currently employed at Samsung Electronics Co., Ltd., one of the leading companies in the technology space. His work at Samsung includes pioneering contributions to the development of advanced semiconductor manufacturing tools, underscoring his role as a key innovator in the industry.

Collaborations: Throughout his career, Ahn has collaborated with talented individuals such as One-Moon Chang and Soo-Young Tak. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and innovation in the field of chemical mechanical polishing.

Conclusion: Jong-Sun Ahn's contributions to the realm of chemical mechanical polishing reflect his dedication to enhancing semiconductor manufacturing processes. His innovative patents and collaborative efforts with his colleagues position him as a significant figure in the technological advancements of the industry. As he continues to develop new technologies, the impact of his work is likely to resonate in future innovations within the field.

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