The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Feb. 28, 2011
Applicants:
One-moon Chang, Yongin-si, KR;
Jae-phil Boo, Seongnam-si, KR;
Soo-young Tak, Suwon-si, KR;
Jong-sun Ahn, Hwaseong-si, KR;
Shin Kim, Hwaseong-si, KR;
Kyoung-moon Kang, Gwangmyeong-si, KR;
Inventors:
One-Moon Chang, Yongin-si, KR;
Jae-Phil Boo, Seongnam-si, KR;
Soo-Young Tak, Suwon-si, KR;
Jong-Sun Ahn, Hwaseong-si, KR;
Shin Kim, Hwaseong-si, KR;
Kyoung-Moon Kang, Gwangmyeong-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A chemical mechanical polishing apparatus includes a platen configured to support and rotate a wafer, and a polishing pad facing the platen. The polishing pad includes a body having a groove with a rotational symmetric pattern.