Suwon-si, South Korea

Soo-Young Tak


Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 22(Granted Patents)


Location History:

  • Suwon-shi, KR (2004)
  • Suwon-si, KR (2014)

Company Filing History:


Years Active: 2004-2014

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4 patents (USPTO):Explore Patents

Title: Innovations by Inventor Soo-Young Tak

Introduction

Soo-Young Tak is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing, with a total of 4 patents to his name. His work is primarily associated with Samsung Electronics Co., Ltd., where he has developed innovative technologies that enhance the efficiency and effectiveness of polishing processes.

Latest Patents

One of his latest patents is a chemical mechanical polishing apparatus that features a platen designed to support a wafer. This apparatus includes a polishing pad, a pad head, and a slurry supply that delivers a slurry onto the wafer. Additionally, it has an injection port located on the second region of the platen, which is configured to inject a predetermined gas towards the edge of the wafer's bottom surface. Another significant patent involves a polishing pad specifically designed for the chemical mechanical polishing process, which includes a body with a groove featuring a rotational symmetric pattern.

Career Highlights

Throughout his career, Soo-Young Tak has focused on advancing the technology behind chemical mechanical polishing. His inventions have played a crucial role in improving the performance and reliability of semiconductor manufacturing processes. His expertise in this area has made him a valuable asset to his company and the industry as a whole.

Collaborations

Soo-Young Tak has collaborated with several talented individuals in his field, including One-Moon Chang and Jae-Phil Boo. These collaborations have fostered innovation and have contributed to the development of cutting-edge technologies in chemical mechanical polishing.

Conclusion

Soo-Young Tak's contributions to the field of chemical mechanical polishing are noteworthy and demonstrate his commitment to innovation. His patents reflect a deep understanding of the technology and its applications in semiconductor manufacturing. His work continues to influence the industry and pave the way for future advancements.

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