Gyeonggi-do, South Korea

Jong Chul Shin

USPTO Granted Patents = 3 

Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Seoul, KR (2009)
  • Hwaseong-si, KR (2018)
  • Gyeonggi-do, KR (2021)

Company Filing History:


Years Active: 2009-2021

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3 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Jong Chul Shin from Gyeonggi-do, KR

Introduction

Jong Chul Shin is an accomplished inventor based in Gyeonggi-do, South Korea. He holds three patents focused primarily on innovative polishing slurry compositions that enhance processes in semiconductor manufacturing. His work reflects a commitment to improving efficiency and efficacy in the field.

Latest Patents

Jong Chul Shin's most recent patents include a chemical-mechanical polishing slurry composition. This composition is notable for its minimal change in pH over time under acidic conditions, allowing for long-term storage. It comprises an abrasive, a small amount of aluminum component (about 0.000006 to 0.01 weight % based on the total weight of the slurry composition), and water. A unique aspect of this invention is that the silanol groups on the surface of the abrasive and the content of the aluminum component satisfy specific criteria outlined in Equation 1: 0.0005 ≤ (silanol concentration) * 100 ≤ 4.5.

Additionally, he developed a metal film polishing slurry composition and a method for reducing scratches during the polishing of metal films. This invention aims to lower the frictional force during polishing, thereby reducing the temperature and improving the thermal stability of the slurry while preventing particle size increase. The method involves applying a specially formulated slurry composition to a substrate before using a polishing pad to remove portions of the metal film.

Career Highlights

Jong Chul Shin has amassed experience working with prominent organizations in the field. He has been associated with Dongjin Semichem Co., Ltd. and the Korea Institute of Science and Technology, where he contributed significantly to advancing semiconductor manufacturing techniques through his inventions.

Collaborations

Throughout his career, Jong Chul has collaborated with talented colleagues, including Jae Hyun Kim and Jong Dai Park. These partnerships have fostered an innovative environment, enhancing the development of effective polishing solutions.

Conclusion

Jong Chul Shin is a prominent figure in the realm of semiconductor manufacturing innovations. His three patents, focused on improving polishing processes, showcase his dedication to enhancing industry efficiency. His collaborations and experience further highlight his significant contributions to innovations in advanced materials and semiconductor technology.

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