Jones Alami

Title: Innovations of Jones Alami in Physical Vapour Deposition Technology

Introduction

Jones Alami is a notable inventor based in Bergisch-Gladbach, Germany. He has made significant contributions to the field of physical vapour deposition technology, holding two patents that showcase his innovative approach to coating devices and methods.

Latest Patents

His latest patents include a physical vapour deposition coating device and a physical vapour deposition method. The coating device comprises a process chamber with an anode and a consumable cathode, which is consumed by an electrical discharge for coating a substrate located within the process chamber. The device also features a first electrical energy source connected to the consumable cathode and a second electrical energy source connected to the anode. Additionally, a third electrical energy source is provided, connected to a source cathode that differs from the consumable cathode. The physical vapour deposition method focuses on coating a substrate using a high-power pulsed magnetron sputtering process, which involves producing a sequence of complex discharge pulses to ionize a sputtering gas.

Career Highlights

Jones Alami is currently employed at Oerlikon Surface Solutions AG in Pfaeffikon. His work at this company has allowed him to further develop his expertise in physical vapour deposition technologies and contribute to advancements in the field.

Collaborations

He collaborates with notable coworkers, including Georg Erkens and Jörg Vetter, who share his passion for innovation in coating technologies.

Conclusion

Jones Alami's contributions to physical vapour deposition technology through his patents and work at Oerlikon Surface Solutions AG highlight his role as a significant inventor in this field. His innovative approaches continue to influence advancements in coating methods and devices.