The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Jul. 28, 2009
Jones Alami, Bergisch Gladbach, DE;
Georg Erkens, Aachen, DE;
Jürgen Müller, Olpe, DE;
Jörg Vetter, Bergisch Gladbach, DE;
Jones Alami, Bergisch Gladbach, DE;
Georg Erkens, Aachen, DE;
Jürgen Müller, Olpe, DE;
Jörg Vetter, Bergisch Gladbach, DE;
OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON, Pfaeffikon, CH;
Abstract
A high-power pulsed magnetron sputtering process, wherein within a process chamber by means of an electrical energy source a sequence of complex discharge pulses is produced by applying an electrical voltage between an anode and a cathode in order to ionize a sputtering gas. The complex discharge pulse is applied for a complex pulse time. The cathode has a target comprising a material to be sputtered for the coating of a substrate, and the complex discharge pulse includes an electrical high-power sputtering pulse having a negative polarity with respect to the anode and being applied for a first pulse-time, the high-power sputtering pulse being followed by an electrical low-power charge cleaning pulse having a positive polarity with respect to the anode and being applied for a second pulse-time. The ratio τ/τof the first pulse-time (τ) in proportion to the second pulse-time (τ) is 0.5 at the most.