Company Filing History:
Years Active: 2018-2020
Title: Innovations of Jonathan Yutkowitz
Introduction
Jonathan Yutkowitz is a notable inventor based in Horsham, PA (US). He has made significant contributions to the field of surface processing technology, holding a total of five patents. His work focuses on improving processes and systems that enhance the efficiency and effectiveness of wafer etching and water resistivity control.
Latest Patents
One of Yutkowitz's latest patents is titled "Two etch method for achieving a wafer thickness profile." This invention discloses a system and method for performing a wet etching process. The system includes multiple processing stations accessible by a transfer device, including a measuring station to optically measure the thickness of a wafer before and after each etching step in the process. The system also features a controller that analyzes the thickness measurements in view of a target wafer profile and generates an etch recipe dynamically and in real time for each etching step. Additionally, the process controller can cause a single wafer wet etching station to etch the wafer according to the generated etching recipes. The system can also generate and refine etch recipes based on pre and post-etch thickness measurements and the target etch profile.
Another significant patent is the "Apparatus and method for metals free reduction and control of resistivity of deionized water." This invention provides a method to convert high resistivity deionized water into lower resistivity water without adding metals. The apparatus discreetly injects carbon dioxide in an on-demand fashion through a metals-free fluid path, achieving a tight resistivity range.
Career Highlights
Yutkowitz is currently employed at Veeco Precision Surface Processing LLC, where he continues to innovate and develop new technologies. His expertise in surface processing has positioned him as a key player in the industry.
Collaborations
He has collaborated with notable coworkers, including John Taddei and David A. Goldberg, contributing to various projects and advancements in their field.
Conclusion
Jonathan Yutkowitz's contributions to the field of surface processing technology through his innovative patents demonstrate his commitment to advancing industry standards. His work continues to influence the efficiency of wafer etching and water resistivity control processes.