Veeco Precision Surface Processing LLC

Jonathan Yutkowitz

John Taddei

David A Goldberg

Laura Mauer

John Clark

Elena Lawrence

Eric Kurt Zwirnmann

A system and method for performing a wet etching process is disclosed. The system includes multiple processing stations accessible by a transfer device, including a measuring station to optically measure the thickness of a wafer before and after each etching steps in the process. The system also includes a controller to analyze the thickness measurements in view of a target wafer profile and generate an etch recipe, dynamically and in real time, for each etching step. In addition, the process controller can cause a single wafer wet etching station to etch the wafer according to the generated etching recipes. In addition, the system can, based on the pre and post-etch thickness measurements and target etch profile, generate and/or refine the etch recipes.

Two etch method for achieving a wafer thickness profile

An apparatus and method to convert high resistivity (18 MOhm/cm) deionized water into lower resistivity deionized water with a tight resistivity range (150 KOhm/cm+\&#x2212;50 KOhm/cm) without adding metals to the DI. The invention discreetly injects carbon dioxide in an on demand fashion through a metals free fluid path.

Apparatus and method for metals free reduction and control of resistivity of deionized water

An apparatus and method to convert high resistivity (18 MOhm/cm) deionized water into lower resistivity deionized water with a tight resistivity range. The apparatus is diminished in size to require less space, has an improved sensitivity resistivity probe to permit a lower operating range, an increased communication rate with updated control logic to permit holding tighter tolerances. The method is environmentally friendly in that it replaces the use of harsh chemistries and eliminates the generation of hazardous waste.

Apparatus and method to reduce and control resistivity of deionized water

Method of etching the back of a wafer to expose TSVs

System and method for updating an arm scan profile through a graphical user interface

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Horsham, PA, United States of America

Jonathan Yutkowitz