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Years Active: 2004-2011
Title: Innovations of Jonathan Rullan in Semiconductor Technology
Introduction
Jonathan Rullan is a notable inventor based in Albany, NY, who has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, Rullan's work focuses on improving the manufacturing processes of semiconductor devices. His innovative methods aim to enhance the efficiency and reliability of these devices in various applications.
Latest Patents
Rullan's latest patents include a method for void-free copper filling of recessed features for semiconductor devices. This method involves several steps, including the deposition of a barrier film and a Ru metal film, followed by the creation of a discontinuous Cu seed layer. The process is designed to ensure that the recessed features are filled with bulk Cu metal without voids, which is crucial for the performance of semiconductor devices. Another significant patent is for integrating selective low-temperature ruthenium deposition into copper metallization of semiconductor devices. This method aims to improve electromigration and stress migration in bulk Cu metal, thereby enhancing the overall reliability of semiconductor devices.
Career Highlights
Throughout his career, Jonathan Rullan has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and IBM. His experience in these organizations has allowed him to develop and refine his innovative techniques, contributing to advancements in semiconductor manufacturing.
Collaborations
Rullan has collaborated with notable professionals in the field, including Kenji Suzuki and Miho Jomen. These collaborations have further enriched his work and have led to the development of cutting-edge technologies in semiconductor fabrication.
Conclusion
Jonathan Rullan's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key inventor in the industry. His work continues to influence the manufacturing processes of semiconductor devices, ensuring their reliability and efficiency in modern applications.