The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6768111 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 27, 2004

Filed:

Sep. 16, 2003
Applicant:
Inventors:

Oliver C. Wells, Yorktown Heights, NY (US);

Lynne M. Gignac, Beacon, NY (US);

Jonathan L. Rullan, Albany, NY (US);

Conal E. Murray, Yorktown Heights, NY (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/300 ; G01K 7/00 ;
U.S. Cl.
CPC ...
G01N 2/300 ; G01K 7/00 ;
Abstract

A method of measurement of topographic features on a surface of a substrate is presented, wherein a focused beam of particles falls onto the surface of the substrate, and backscattered particles are detected with a particle detector. An opaque material is interposed between the surface and the detector, and the position of the shadow of an edge of the opaque material on the detector is recorded. The relative position of the edge and the surface of the substrate is then determined, and the topography of the surface determined as the particle beam and the substrate are moved with respect to one another.


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Wells, Oliver. (2004). Method for sem measurement of topological features (U.S. Patent No. 6768111). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6768111

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