Jon M Williams

Title: Jon M Williams: Innovator in Embedded Circuit Technology

Introduction

Jon M Williams is a notable inventor based in Gilbert, AZ (US). He has made significant contributions to the field of embedded circuit technology, holding a total of 2 patents. His work focuses on innovative methods for selective electroless plating of dielectric layers, which are crucial in modern electronics.

Latest Patents

Williams' latest patents include "Embedded Circuit Patterning Feature Selective Electroless" and "Embedded Circuit Patterning Feature Selective Electroless Copper Plating." Both patents describe methods for the selective electroless plating of dielectric layers. In these embodiments, a dielectric layer is patterned to create one or more patterned surfaces. A seed layer is selectively formed along these surfaces, allowing for metal deposition only on the patterned areas. The dielectric layer is doped with an activator precursor, and laser-assisted local activation is performed to ensure that the seed layer is formed exclusively on the patterned surfaces. This innovative approach enhances the efficiency and precision of circuit manufacturing.

Career Highlights

Jon M Williams is currently employed at Intel Corporation, where he continues to push the boundaries of technology in embedded circuits. His expertise in electroless plating processes has positioned him as a key player in the development of advanced electronic components.

Collaborations

Williams has collaborated with talented coworkers such as Yonggang Li and Aritra Dhar. Their combined efforts contribute to the innovative projects at Intel Corporation, fostering a collaborative environment that drives technological advancements.

Conclusion

Jon M Williams is a distinguished inventor whose work in embedded circuit technology has led to significant advancements in the field. His patents reflect a commitment to innovation and excellence in electronics manufacturing.