Company Filing History:
Years Active: 2018-2019
Title: JoJo Lee: Innovator in Atomic Layer Deposition Technologies
Introduction
JoJo Lee is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in atomic layer deposition (ALD) processes. With a total of 2 patents to his name, Lee's work is instrumental in advancing technology in this area.
Latest Patents
One of JoJo Lee's latest patents focuses on the "Pre-deposition treatment and atomic layer deposition (ALD) process and structures formed thereby." This patent describes various methods and structures formed by those methods. In accordance with the method, a first metal-containing layer is formed on a substrate, followed by the formation of a second metal-containing layer on the same substrate. Notably, the material of the first metal-containing layer differs from that of the second. A chlorine-based treatment is then performed on both layers, after which a third metal-containing layer is deposited using Atomic Layer Deposition (ALD).
Career Highlights
JoJo Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to explore innovative techniques that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, JoJo Lee has collaborated with notable colleagues, including Cheng-Yen Tsai and Da-Yuan Lee. These collaborations have contributed to the development of advanced technologies in the semiconductor field.
Conclusion
JoJo Lee's contributions to atomic layer deposition and semiconductor manufacturing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in this critical industry.