Location History:
- Nacogdoches, TX (US) (1994)
- Los Altos, CA (US) (1996 - 2006)
Company Filing History:
5 out of 13,726 
3 out of 34 
1 out of 832,891 Years Active: 1994-2006
Title: The Innovative Contributions of John S. Hearne
Introduction
John S. Hearne is a notable inventor based in Los Altos, California, recognized for his significant contributions to the field of chemical mechanical polishing. With a total of nine patents to his name, Hearne has developed innovative solutions that enhance the efficiency and effectiveness of polishing processes in semiconductor manufacturing.
Latest Patents
Among his latest patents is the "Flexible Polishing Fluid Delivery System." This invention provides a method and apparatus for delivering polishing fluid to a chemical mechanical polishing surface. The apparatus features an arm with multiple holes designed to retain polishing fluid delivery tubes. This design allows for controlled distribution of polishing fluid, enabling precise management of local polishing rates across the diameter of a substrate being polished.
Another significant patent is the "Hydraulically Actuated Wafer Clamp." This invention focuses on a wafer clamping mechanism that utilizes fluid pressure to securely retain wafers on a surface with minimal clamping force. The mechanism incorporates various embodiments, including a piston and cylinder arrangement, a bellows system, and a bladder mechanism, all aimed at efficiently clamping wafers while minimizing the required force.
Career Highlights
Throughout his career, John S. Hearne has worked with prominent companies in the semiconductor industry, including Applied Materials, Inc. and Ontrak Systems, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in polishing technologies.
Collaborations
Hearne has collaborated with notable professionals in his field, including Boris Fishkin and Robert B. Lowrance. These collaborations have further enriched his work and led to innovative solutions in the industry.
Conclusion
John S. Hearne's contributions to the field of chemical mechanical polishing through his patents and collaborations highlight his role as a significant inventor. His innovative solutions continue to impact the semiconductor manufacturing process positively.