Company Filing History:
Years Active: 2013-2016
Title: **Innovations by John Robert Fairhurst: A Pioneer in Substrate Processing**
Introduction
John Robert Fairhurst, based in Plaistow, NH, is an accomplished inventor known for his significant contributions to substrate processing technologies. With a portfolio of five patents, Fairhurst has played an instrumental role in advancing methods and apparatuses that enhance the performance of ion implantation systems.
Latest Patents
Among his latest innovations, Fairhurst developed a "Method and apparatus for clamping and cooling a substrate for ion implantation." This invention details a system designed to hold and cool substrates during processing effectively. The substrate clamp features an engagement portion that securely grips the substrate around its inside diameter and adjacent surface areas. This design allows for a retracted position for easy access and an expanded position to ensure a firm hold during processing. Moreover, the inclusion of conformal coatings enhances the engagement, while energy-absorbing coatings optimize the absorption of radiative energy emitted from the substrate.
Another notable patent is the "Method and apparatus for holding a plurality of substrates for processing." This invention introduces a substrate carrier system that consists of a carrier plate, a cover plate, and multiple substrate support slots. Designed with recesses to receive substrates, the system incorporates protrusions that engage the outer diameter (OD) of each substrate. The innovative use of a rotatable cover plate allows for efficient loading and locking of substrates into their respective recesses, ensuring a streamlined processing workflow.
Career Highlights
Fairhurst has dedicated his career to working with Varian Semiconductor Equipment Associates, Inc., where he has made significant advancements in ion implantation technology. His expertise in substrate processing has positioned him as a key figure in the field, and his patents reflect an ongoing commitment to innovation.
Collaborations
Throughout his career, Fairhurst has collaborated with esteemed colleagues such as Jeffrey E. Krampert and Richard John Hertel. Their combined expertise has contributed to the development of pioneering technologies, driving the semiconductor industry forward and enhancing fabrication processes.
Conclusion
John Robert Fairhurst's contributions to substrate processing highlight the importance of innovation in the semiconductor sector. His patents not only address current industry challenges but also pave the way for future advancements in ion implantation technology. With a collaborative spirit and a focus on practical solutions, Fairhurst remains a pivotal figure in the realm of semiconductor research and development.
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