John R Behnke

Title: John R Behnke: Innovator in Semiconductor Technology

Introduction

John R Behnke is a prominent inventor based in Austin, TX, known for his significant contributions to semiconductor technology. With a total of 5 patents to his name, Behnke has made strides in developing methods that enhance the efficiency and capabilities of semiconductor devices.

Latest Patents

Among his latest patents is a groundbreaking method for forming a semiconductor device that features core and periphery regions. This innovative approach includes a line and space pattern with variable pitch and critical dimensions in a layer on a substrate. The substrate is divided into a core region and a periphery region, where the first sub-line and space pattern in the core region comprises a space dimension (A) that is less than what can be achieved by lithographic processes alone. Additionally, the second sub-line and space pattern in the periphery region includes at least one line with a second critical dimension (B) that is achievable by lithography. This method employs two critical masking steps to create a hard mask in the core region, which includes a critical dimension (A) that is less than the resolution limit of lithography. Furthermore, a single etch step is utilized to transfer the pattern of the hard mask to the layer.

Career Highlights

John R Behnke is currently associated with Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work has been instrumental in advancing the technology used in modern electronic devices.

Collaborations

Behnke has collaborated with notable colleagues, including Anthony John Toprac and Matthew A Purdy, contributing to the innovative projects at Advanced Micro Devices Corporation.

Conclusion

John R Behnke's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor devices.