This inventor holds 10 USPTO granted patents. Top assignees: Rca Inc., The Boc Group, Inc.. Active years: 1977-1997.
Company Filing History:
Years Active: 1977-1997
Title: Innovations of John L Vossen
Introduction
John L Vossen is a notable inventor based in Bridgewater, NJ (US). He has made significant contributions to the field of magnetron sputtering systems, holding a total of 10 patents. His work has greatly influenced the efficiency and effectiveness of sputtering processes used in various applications.
Latest Patents
One of his latest patents is an anode structure for magnetron sputtering systems. This elongated anode structure features multiple points to which electrons are attracted. The anode can be constructed from multiple wire brushes attached to a metal rod. The use of this anode in magnetron systems significantly reduces dielectric material build-up and improves film uniformity in both direct current reactive and non-reactive sputtering. Additionally, the anode reduces overheating and increases the operational time of magnetron systems undergoing reactive sputtering of dielectric materials. In one embodiment, the magnetron system includes a cylindrical cathode and a pair of elongated anodes positioned parallel to and equidistant from the cathode. This anode structure is particularly suited for sputtering uniform films of dielectric materials, including silicon dioxide and silicon nitride.
Career Highlights
Throughout his career, John L Vossen has worked with several prominent companies, including RCA Inc. and The BOC Group, Inc. His experience in these organizations has allowed him to refine his skills and contribute to innovative technologies in the field.
Collaborations
John has collaborated with notable individuals such as Bernard Halon and Peter A Sieck. These partnerships have further enhanced his work and led to advancements in the technologies he has developed.
Conclusion
John L Vossen's contributions to the field of magnetron sputtering systems demonstrate his innovative spirit and dedication to improving technology. His patents and collaborations reflect a commitment to excellence in engineering and invention.

