The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 1983
Filed:
Mar. 25, 1982
Applicant:
Inventors:
John L Vossen, Jr, Bridgewater, NJ (US);
Bernard Halon, Brooklyn, NY (US);
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156656 ; 1566591 ; 156665 ; 2041 / ; 252 791 ;
Abstract
A method of improving the uniformity and line-width control in the plasma etching of aluminum and its alloys by adding to the etchant gas an effective amount of a gaseous hydrocarbon which will polymerize under glow discharge conditions.
Vossen, Jr, John. (1983). Plasma etching of aluminum (U.S. Patent No. 4372807). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4372807
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile