Bernard Halon is a notable inventor based in Brooklyn, NY. He has made significant contributions to the field of plasma etching, particularly in the etching of aluminum and its alloys. With a total of 6 patents to his name, Halon's work has had a substantial impact on the semiconductor manufacturing industry.

Latest Patents

Halon's latest patents include innovative methods for improving the etching process of aluminum. One of his notable inventions is an improved etchant gas composition for the plasma etching of aluminum or its alloys. This composition comprises boron trichloride, nitrogen, and a halogenated fluorocarbon. It not only provides an efficient, anisotropic etch but also forms a passivating coating on aluminum reactor walls, which protects them from being etched and reduces contamination problems. Another significant patent involves a method for improving the uniformity of etching in the plasma etching of aluminum substrates. This method utilizes a getter plate made of tantalum, which enhances the etching uniformity across the substrate.

Career Highlights

Halon has had a distinguished career, working with RCA Inc., where he has been able to apply his innovative ideas in practical settings. His work has been instrumental in advancing the technology used in semiconductor fabrication.

Collaborations

Throughout his career, Halon has collaborated with esteemed colleagues such as John L. Vossen and Jer-shen Maa. These collaborations have further enriched his contributions to the field of plasma etching.

Conclusion

Bernard Halon is a prominent figure in the realm of semiconductor technology, with his patents reflecting a deep understanding of plasma etching processes. His innovative approaches continue to influence the industry and pave the way for future advancements.

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