Palo Alto, CA, United States of America

John L Vaught


Average Co-Inventor Count = 1.8

ph-index = 11

Forward Citations = 953(Granted Patents)


Company Filing History:


Years Active: 1982-1994

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):

Title: **Innovator Spotlight: John L. Vaught**

Introduction

John L. Vaught, a prominent inventor based in Palo Alto, California, is recognized for his significant contributions to optical inspection technologies. With a remarkable portfolio of 11 patents, Vaught has developed innovative solutions that enhance the capabilities of surface inspection systems, particularly in semiconductor manufacturing.

Latest Patents

Among his latest creations, Vaught has designed an **Adaptive Spatial Filter for Surface Inspection**. This advanced inspection apparatus utilizes a planar array of individually addressable light valves acting as spatial filters in an imaged Fourier plane of a diffraction pattern. These valves are uniquely configured with a stripe geometry corresponding to positions of the diffraction pattern, selectively blocking light from specific members while allowing transmission from non-repetitive features like dirt or defects. This innovative design ensures effective detection of anomalies in patterned surfaces, such as semiconductor wafers.

Another notable patent from Vaught is the **Speckle Reduction Track Filter Apparatus for Optical Inspection**. This device inspects patterned wafers and substrates with periodic features to identify particles and defects using a spatial filter in conjunction with broadband and angularly diverse illumination. Vaught's approach effectively illuminates substrates while blocking diffraction from periodic features, allowing for a clearer inspection of aperiodic features through imaging techniques.

Career Highlights

Throughout his career, John L. Vaught has collaborated with leading technology firms, including Tencor Instruments and Hewlett-Packard Company. His work has significantly impacted the development of optical inspection systems, enhancing quality control processes in the semiconductor industry.

Collaborations

During his professional journey, Vaught has worked alongside notable colleagues, such as Armand P. Neukermans and David K. Donald. These collaborations have fostered innovative thinking and technological advancements in the field of optical inspection and related technologies.

Conclusion

John L. Vaught's contributions to the invention of advanced inspection technologies underscore his role as a leading inventor in the field. With a focus on enhancing optical inspection methods, his latest patents reflect a commitment to improving quality in semiconductor manufacturing. As the industry evolves, Vaught's innovations will likely continue to play a crucial role in shaping the future of surface inspection technologies.

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