The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 1994

Filed:

May. 12, 1992
Applicant:
Inventors:

Lee K Galbraith, Mountain View, CA (US);

John L Vaught, Palo Alto, CA (US);

Ralph C Wolf, Palo Alto, CA (US);

Brian Leslie, Cupertino, CA (US);

Armand P Neukermans, Palo Alto, CA (US);

Assignee:

Tencor Instruments, Mountain View, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
356237 ; 356 71 ; 250550 ;
Abstract

An inspection apparatus for a light diffracting surface employs a planar array of individually addressable light valves for use as a spatial filter in an imaged Fourier plane of a diffraction pattern, with valves having a stripe geometry corresponding to positions of members of the diffraction pattern, blocking light from those members. The remaining valve stripes, i.e. those not blocking light from diffraction order members, are open for transmission of light. Light directed onto the surface, such as a semiconductor wafer, forms elongated curved diffraction orders from repetitive patterns of circuit features. The curved diffraction orders are transformed to linear orders by a Fourier transform lens. The linear diffraction orders from repetitive patterns of circuit features are blocked, while light from non-repetitive features, such as dirt particles or defects is allowed to pass through the light valves to a detector. Patterns of stripes can be recorded corresponding to the repetitive features of different integrated circuits. Different filters may be rapidly switched electronically in synchronization with a beam scanning a patterned surface inspecting different light diffracting patterns in different positions, allowing scattered or diffracted light from non-repetitive features to pass through the filter to a detector. A logical AND combination of two filters may be used so that two regions may be inspected in a single scan of the beam.


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