This inventor holds 3 USPTO granted patents. Top assignees: University of Georgia Research Foundation Inc, National Technology & Engineering Solutions of Sandia, LLC. Active years: 1994-2017.
Company Filing History:
2 out of 870 
1 out of 1,080 
Years Active: 1994-2017
Title: John L Stickney: Innovator in Electroless Atomic Layer Deposition
Introduction
John L Stickney is a notable inventor based in Athens, GA (US). He has made significant contributions to the field of materials science, particularly in the area of atomic layer deposition. With a total of 3 patents to his name, Stickney's work has advanced the understanding and application of innovative deposition techniques.
Latest Patents
One of Stickney's latest patents is focused on electroless atomic layer deposition. This method describes a process that electrolessly generates a layer of sacrificial material on the surface of a first material. The technique involves adding doses of a solution of a second material to the substrate and performing a galvanic exchange reaction. This reaction oxidizes the sacrificial material, allowing for the deposition of the second material on the first material's surface. The method can be repeated multiple times to achieve the desired thickness of the second material.
Another significant patent by Stickney is related to digital electrochemical etching of compound semiconductors. This method utilizes an electrochemical flow cell system where alternating electrochemical potentials are applied between a reference electrode and the compound semiconductor. This process effectively strips atomic layers of elements from the compound semiconductors, showcasing Stickney's innovative approach to semiconductor processing.
Career Highlights
Throughout his career, John L Stickney has worked with esteemed organizations such as the University of Georgia Research Foundation Inc and National Technology & Engineering Solutions of Sandia, LLC. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research.
Collaborations
Stickney has collaborated with notable colleagues, including David M Benson and Brian W Gregory. These partnerships have further enriched his research and development efforts, leading to advancements in the technologies he has pioneered.
Conclusion
John L Stickney's contributions to the field of atomic layer deposition and semiconductor processing highlight his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in research and development.