John L Carroll is a prominent inventor based in Portland, OR (US), known for his significant contributions to plasma processing technology. With a total of 11 patents to his name, Carroll has made notable advancements in the field, particularly in the development of systems that utilize broadband radio frequency (RF) waveforms.

Latest Patents

One of Carroll's latest patents focuses on plasma processing with broadband RF waveforms. This innovative plasma system includes a plasma apparatus comprising a plasma chamber and a substrate support. The system features an electromagnetic (EM) circuit block coupled to a radio frequency (RF) electrode. The EM circuit block incorporates a broadband RF waveform function generator, which distributes EM power over a range of frequencies. Additionally, a broadband impedance matching network is included, ensuring optimal performance across the operating frequency range. The system is equipped with a controller programmed to adjust input parameters of the EM circuit block, enhancing its efficiency and effectiveness.

Career Highlights

Throughout his career, John L Carroll has worked with notable companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his expertise in plasma processing and contribute to cutting-edge technological advancements.

Collaborations

Carroll has collaborated with esteemed colleagues such as Jianping Zhao and Dennis Bellehumeur, further enriching his work and expanding the impact of his innovations.

Conclusion

John L Carroll's contributions to plasma processing technology exemplify his dedication to innovation and advancement in the field. His patents and collaborations reflect a commitment to pushing the boundaries of what is possible in plasma systems.

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