Faringdon, United Kingdom

John K Williams

This inventor holds 5 USPTO granted patents. Top assignees: Tetronics Research and Development Company Ltd., Manville Corporation, Nippon Silica Glass Co., Ltd.. Active years: 1990-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John K Williams. Retrieved from https://idiyas.com/inventor/john-k-williams-374omkmd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 27(Granted Patents)


Location History:

  • Stanford in the Vale, GB (1990)
  • Faringdon, GB (1991 - 1994)

Company Filing History:


Years Active: 1990-1994

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Inventor John K. Williams and His Contributions to Fused Silica Production

Introduction

John K. Williams, a pioneering inventor based in Faringdon, GB, has made significant contributions to the field of plasma technology, particularly in the production of fused silica. With a total of five patents to his name, his work emphasizes innovation and practicality, demonstrating a commitment to advancing materials science.

Latest Patents

Among his latest inventions are a plasma torch and an apparatus for producing fused silica using plasma. This innovative apparatus includes at least one anodic plasma arc electrode and one cathodic plasma arc electrode, which are adjustably arranged to couple their plasma arcs together. This setup creates a plasma arc coupling zone where feedstock material is introduced. A platform positioned beneath this zone collects the resulting silica product, with the unique feature of being able to rotate and move vertically. Furthermore, the plasma anode torch utilized in the apparatus is designed with a cylindrical nozzle housing a non-consumable copper electrode, incorporating a channel for plasma gas to enhance the process of silica production.

Career Highlights

John K. Williams has had a robust career, working with reputable organizations such as Tetronics Research and Development Company Ltd. and Manville Corporation. His experiences at these companies enabled him to refine his engineering skills and develop innovative solutions in plasma technology.

Collaborations

Throughout his career, Williams has collaborated with notable coworkers, including Charles P. Heanley and Leonard E. Olds. These partnerships have played an essential role in fostering a collaborative environment that nurtures creativity and innovation in their projects.

Conclusion

John K. Williams stands out as a remarkable inventor with a focus on developing technologies for producing fused silica through plasma methods. His five patents reflect his dedication to innovation, and his contributions continue to influence the field significantly. His work exemplifies how inventive spirit and technical expertise can lead to substantial advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…