The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1994
Filed:
Jul. 20, 1993
Charles P Heanley, Faringdon, GB;
John K Williams, Faringdon, GB;
Takumi Fukunishi, Sagamihara, JP;
Takao Matsuoka, Tokyo, JP;
Tetronics Research & Development Co. Limited, Faringdon, GB;
Nippon Silica Glass Co., Ltd., Tokyo, JP;
Abstract
An apparatus for producing fused silica includes at least one anodic plasma arc electrode and at least one cathodic plasma arc electrode adjustably arranged with respect to one another so that the plasma arcs formed thereby couple together to form a plasma arc coupling zone. A feedstock material is fed into a region between the electrodes or to a region near the electrodes where the plasma arc coupling zone is formed. A platform is located beneath the plasma arc coupling zone to receive the silica product which is formed in the plasma arc coupling zone. The platform may be rotated about its axis and move up and down along its axis. A cooling device also may be included with the platform. The plasma anode torch used in the apparatus includes a cylindrical nozzle with a non-consumable, copper, blunt ended electrode disposed therein. A channel is provided between the electrode and the nozzle wall to allow the plasma gas to pass through the torch.