The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1993
Filed:
Mar. 30, 1992
Applicant:
Inventors:
Charles P Heanley, Faringdon, GB;
John K Williams, Faringdon, GB;
Takumi Fukunishi, Sagamihara, JP;
Takao Matsuoka, Tokyo, JP;
Assignees:
Tetronics Research & Development Co. Ltd., Faringdon, GB;
Nippon Silica Glass Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912159 ; 21912138 ; 21912152 ; 21912148 ; 423335 ;
Abstract
Method for the production of fused silica in which a particulate silica feedstock material is passed from a silica feed tube through or near a plasma arc coupling zone in which at least two plasma arcs of opposite polarity are coupled, thereby raising the temperature of the feedstock material and collecting the material as fused silica.