Burlingame, CA, United States of America

John J Geraghty

This inventor holds 3 USPTO granted patents. Top assignees: Mitsubishi Materials Corporation, Ebara Corporation. Active years: 2001-2006.


% Patents Active = 100.0

Average Co-Inventor Count = 5.3

ph-index = 3

Forward Citations = 90(Granted Patents)


Company Filing History:


Years Active: 2001-2006

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3 patents (USPTO):Explore Patents

Title: John J Geraghty: Innovator in Chemical Mechanical Polishing Technology

Introduction

John J Geraghty is a notable inventor recognized for his contributions to the field of semiconductor manufacturing. He has been awarded a total of 3 patents that focus on advancements in chemical mechanical polishing technology. His innovative designs aim to enhance the uniformity and efficiency of polishing processes for semiconductor wafers.

Latest Patents

Geraghty's latest patents include a "Chemical mechanical polishing head assembly having floating wafer carrier and retaining ring." This invention provides a structure and method for achieving a uniformly polished substrate, such as a semiconductor wafer. It includes a polishing apparatus with a housing, a carrier for mounting the substrate, and a retaining ring that allows for relative movement. The design features pressure chambers that exert force against the retaining ring and subcarrier, ensuring uniform polishing across the wafer's surface. Another significant patent is the "Chemical mechanical polishing head having floating wafer retaining ring and wafer carrier with multi-zone polishing pressure control." This invention allows for customization of polishing pressure across the wafer's surface, further improving material removal uniformity.

Career Highlights

Throughout his career, John J Geraghty has worked with prominent companies in the semiconductor industry, including Mitsubishi Materials Corporation and Ebara Corporation. His experience in these organizations has contributed to his expertise in developing innovative polishing technologies.

Collaborations

Geraghty has collaborated with notable professionals in the field, including William Dyson, Jr. and Tanlin K Dickey. These collaborations have likely enriched his work and contributed to the advancements in chemical mechanical polishing.

Conclusion

John J Geraghty is a distinguished inventor whose work in chemical mechanical polishing technology has significantly impacted the semiconductor manufacturing industry. His patents reflect a commitment to innovation and improvement in polishing processes, ensuring greater efficiency and uniformity in semiconductor production.

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