John C Matthews

Title: The Innovative Contributions of John C Matthews in Semiconductor Technology

Introduction

John C Matthews, based in Columbia, MD, is a prominent inventor known for his significant contributions to semiconductor technology. With a total of five patents to his name, Matthews has developed cutting-edge methods and apparatuses that improve the efficiency of photoresist stripping processes, which are critical in semiconductor manufacturing.

Latest Patents

One of Matthews' latest innovations is a "Method for Photoresist Stripping Using Reverse Flow." This method and apparatus facilitate the effective removal of a photoresist layer from a semiconductor wafer. The process involves feeding oxidizing gas from the edge of the wafer to its center, ensuring optimal stripping efficiency. Additionally, the oxidizing gas can be directed to first contact a heated wafer support platform before reaching the wafer, enhancing the overall processing conditions.

Another significant patent by Matthews is the "Apparatus for Photoresist Stripping." This innovative device employs an oxidizing fluid, such as ozone, to rapidly strip the photoresist. The design features a very thin layer of oxidizing fluid, merely four millimeters or less, that flows over the photoresist at high velocity while simultaneously heating the resist. Furthermore, the resist may be exposed to ultraviolet radiation at an irradiance of at least about 800 milliwatts/cm², which aids in achieving effective removal of the photoresist.

Career Highlights

Throughout his career, Matthews has worked with notable companies, including Fusion Systems Corporation and Fusion Semiconductor Systems. His experience in these organizations has contributed greatly to his innovative capabilities and understanding of semiconductor processes.

Collaborations

In his innovative journey, Matthews has collaborated with accomplished professionals in the field, such as Stuart N Rounds and Michael G Ury. These partnerships have likely synergized their collective expertise, leading to groundbreaking developments in semiconductor technologies.

Conclusion

John C Matthews is a distinguished inventor whose patents are instrumental in advancing photoresist stripping technologies in the semiconductor industry. His inventive methodologies and apparatuses contribute to improving manufacturing processes, showcasing the critical role of innovation in technology.