The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 1985
Filed:
May. 23, 1983
Applicant:
Inventor:
John C Matthews, Columbia, MD (US);
Assignee:
Fusion Semiconductor Systems, Rockville, MD (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
20415918 ; 20415914 ; 430325 ; 430326 ; 430330 ;
Abstract
Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to exposure to the radiation. The temperature of the photoresist can be controlled by a thermal chuck which contains a thermal ballast of heat conducting material.
Published as:
GB8413010D0; GB2143961A; DE3419217A1; JPS6045247A; US4548688A; GB2143961B; JPH02209724A; JPH0526189B2; JPH0527107B2; DE3419217C2;