Cupertino, CA, United States of America

John Batey



Average Co-Inventor Count = 4.9

ph-index = 6

Forward Citations = 180(Granted Patents)


Location History:

  • San Francisco, CA (US) (2009 - 2010)
  • San Jose, CA (US) (2012)
  • Cupertino, CA (US) (2009 - 2013)

Company Filing History:


Years Active: 2009-2013

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7 patents (USPTO):Explore Patents

Title: Innovations of John Batey

Introduction

John Batey is a notable inventor based in Cupertino, CA, with a remarkable portfolio of seven patents. His work primarily focuses on advancements in microelectromechanical systems (MEMS), showcasing his expertise in the field of electromechanical devices.

Latest Patents

Among his latest patents, Batey has developed innovative methods for fabricating MEMS devices. One of his patents, titled "Electromechanical devices having etch barrier layers," outlines a method that involves creating a first layer with a film that possesses both electromechanical and optical responses. The invention aims to modify the undesirable electromechanical response by reducing charge buildup during the device's activation. Another significant patent, "Controlling electromechanical behavior of structures within a microelectromechanical systems device," similarly focuses on enhancing the performance of MEMS devices by addressing the electromechanical response.

Career Highlights

Throughout his career, John Batey has contributed to leading companies in the technology sector. He has worked with Qualcomm MEMS Technologies, Inc. and IDC, LLC, where he applied his innovative ideas to develop cutting-edge technologies.

Collaborations

Batey has collaborated with several professionals in his field, including Manish Kothari and Clarence Chui. These partnerships have likely enriched his work and contributed to the success of his inventions.

Conclusion

John Batey's contributions to the field of microelectromechanical systems through his patents and collaborations highlight his significant impact on technology innovation. His work continues to influence advancements in electromechanical devices.

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