John Anthony Marsella

This inventor holds 28 USPTO granted patents, plus 2 CIPO patents and 4 EPO patents, primarily in Chemical Engineering. Top assignees: Air Products and Chemicals, Inc., Versum Materials US, LLC. Active years: 1985-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Anthony Marsella. Retrieved from https://idiyas.com/inventor/john-anthony-marsella

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28

% Patents Active = 85.7

CIPO Patents = 2

EPO Patents = 4 (Patent Applications = 4)

Average Co-Inventor Count = 2.1

ph-index = 6

Forward Citations = 86(Granted Patents)

Company Filing History:

26 out of 3,219

Air Products and Chemicals, Inc.

patents

1 out of 223

Versum Materials US, LLC

patents

where one patent can have more than one assignee

Years Active: 1985-2018

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Areas of Expertise:

Chemical Mechanical Polishing

Shallow Trench Isolation

Curing Agents

Photoresist Removal

Bridged Carbocyclic Compounds

Low VOC Wipes

Alkylformamide Surfactants

Cyclic Urea Surfactants

Epoxy Resins

Fluorinated Compounds

Polyamine Boranes

Tertiary Alkanolamines

28 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10011741 - Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof (2018-07-03),

2. 9305476 - Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof (2016-04-05),

3. 9062230 - Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof (2015-06-23),

4. 8859428 - Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof (2014-10-14),

5. 8501997 - Curing agent for low temperature cure applications (2013-08-06),

6. 8288330 - Composition and method for photoresist removal (2012-10-16),

7. 7138550 - Bridged carbocyclic compounds and methods of making and using same (2006-11-21),

8. 7078358 - Low VOC cleanroom cleaning wipe (2006-07-18),

9. 6605145 - Alkylformamide surfactants (2003-08-12),

10. 6281170 - Surface tension reduction with N,N,N'-trialkkyl ureas (2001-08-28),

11. 6262156 - Cyclic urea surfactants (2001-07-17),

12. 6238849 - Cyclic ureas in photoresist developers (2001-05-29),

13. 6179906 - Cyclic urea surfactants (2001-01-30),

14. 6120978 - Use of N,N-dialkyl ureas in photoresist developers (2000-09-19),

15. 6096891 - Process for the production of cyclic N,N'-dialkylureas (2000-08-01),

Title: Innovations and Contributions of John Anthony Marsella in Chemical Mechanical Polishing

Introduction: John Anthony Marsella is a prominent inventor based in Allentown, PA, recognized for his significant contributions to the field of chemical mechanical polishing (CMP). With a remarkable portfolio of 27 patents, Marsella has made substantial strides in enhancing the efficiency and effectiveness of polishing compositions used in semiconductor manufacturing.

Latest Patents: Among his latest innovations are two notable patents focused on chemical mechanical polishing composition for shallow trench isolation (STI) applications. These patents detail methods for removing, reducing, or treating trace metal contaminants and smaller fine-sized cerium oxide particles from cerium oxide slurry or CMP compositions. The inventions emphasize the treatment of these components to minimize defects related to nano-sized particles, leading to improved substrate polishing outcomes. Specifically, treated CMP compositions aid in polishing substrates that feature silicon dioxide film required for STI processing.

Career Highlights: John Marsella has worked with leading companies in the field, including Air Products and Chemicals, Inc. and Versum Materials US, LLC. His career reflects a dedication to advancing the technologies involved in CMP processes, which are pivotal in semiconductor fabrication.

Collaborations: Throughout his career, Marsella has collaborated with esteemed colleagues such as Kevin Rodney Lassila and Xiaobo Shi. These partnerships have fostered innovative developments in CMP technology that enhance performance and reduce defects in semiconductor devices.

Conclusion: John Anthony Marsella's contributions to the chemical mechanical polishing field underscore the importance of innovation in modern manufacturing processes. With his extensive patent portfolio and collaborative efforts, he continues to influence advancements that drive the semiconductor industry forward. His work exemplifies how dedicated inventors can lead to significant improvements in technology and production efficiency.

Profile summary based on public USPTO records.