Sudbury, MA, United States of America

John A Doherty


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 74(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: John A Doherty: Innovator in Focused Ion Beam Processing

Introduction

John A Doherty is a notable inventor based in Sudbury, MA (US). He has made significant contributions to the field of ion beam technology, particularly through his innovative patent related to focused ion beam processing. His work has implications for various applications in materials science and engineering.

Latest Patents

Doherty holds a patent for an apparatus that enables precise sputter etching and imaging of insulating and other targets. This invention utilizes a finely focused beam of ions produced from a liquid metal ion source. The apparatus is designed to produce and control a submicron beam of ions, allowing for accurate sputter etching of the target material. Additionally, a beam of electrons is directed onto the target to neutralize the charge created by the incident ion beam. This technology facilitates imaging of the target surface and ultra-precise control of the etching process by monitoring the particles sputtered from the target surface.

Career Highlights

Doherty's career is marked by his role at Micrion Limited Partnership, where he has been instrumental in advancing ion beam technology. His expertise in focused ion beam processing has positioned him as a key figure in the field, contributing to the development of innovative solutions for complex engineering challenges.

Collaborations

Throughout his career, Doherty has collaborated with notable colleagues, including Billy W Ward and David C Shaver. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

John A Doherty's contributions to focused ion beam processing exemplify the impact of innovative thinking in technology. His patent and work at Micrion Limited Partnership highlight the importance of precision in engineering applications. His collaborations further enhance the potential for advancements in this critical field.

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