This inventor holds 2 USPTO granted patents. Top assignee: U.S. Philips Corporation. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Johannus Me Van Laarhoven: Innovator in Aperture Technology
Introduction
Johannus Me Van Laarhoven is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of technology, particularly in the area of providing patterns of apertures and cavities in various materials. With a total of 2 patents to his name, he continues to push the boundaries of innovation.
Latest Patents
His latest patents include a method of providing a pattern of apertures and/or cavities in a plate. This method involves using a mask with a plurality of apertures arranged in a specific pattern. After the mask is applied, at least one jet of abrasive powder particles is moved relative to the plate. The mask is coated to prevent substantial mechanical stresses during the process, ensuring the integrity of the mask and the quality of the resulting pattern.
Career Highlights
Johannus is currently associated with U.S. Philips Corporation, where he applies his expertise in developing innovative solutions. His work has been instrumental in advancing technologies that rely on precise patterns in materials.
Collaborations
He has collaborated with notable colleagues, including Franciscus C De Haas and Franciscus M Van Laarhoven, contributing to a dynamic and innovative work environment.
Conclusion
Johannus Me Van Laarhoven exemplifies the spirit of innovation through his patents and contributions to technology. His work continues to influence the field, showcasing the importance of creativity and collaboration in driving advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile