The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1998
Filed:
Nov. 12, 1996
Franciscus CM. De Haas, Eindhoven, NL;
Franciscus MH. Van Laarhoven, Eindhoven, NL;
Johannus ME. Van Laarhoven, Eindhoven, NL;
Henricus J Ligthart, Eindhoven, NL;
Petrus HW. Swinkels, Eindhoven, NL;
Johannes G Van Beek, Eindhoven, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
A method of providing a plurality of cavities and/or apertures in a plate or layer wherein, after the plate or layer has been provided with a mask having a plurality of apertures arranged in a pattern, at least one jet of abrasive powder particles is moved relative to the plate. On its exposed surface, the mask is provided with a coating which prevents substantial mechanical stresses from being generated in the mask during the process by the jet of powder particles.