The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 1998

Filed:

Jul. 07, 1995
Applicant:
Inventors:

Franciscus C De Haas, Eindhoven, NL;

Franciscus M Van Laarhoven, Eindhoven, NL;

Johannus M Van Laarhoven, Eindhoven, NL;

Henricus J Ligthart, Eindhoven, NL;

Petrus H Swinkels, Eindhoven, NL;

Johannes G Van Beek, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
445 24 ; 451 29 ;

Find Patent Forward Citations

De Haas, Franciscus. (1998). Method of providing a pattern of apertures and/or cavities in a plate of (U.S. Patent No. 5730635). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5730635

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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