This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Innovations by Johannes Schöneberg
Introduction
Johannes Schöneberg is a notable inventor based in Darmstadt, Germany. He has made significant contributions to the field of lithography, particularly in the area of mask defect repair. His innovative approach has led to the development of a unique method, device, and computer program aimed at enhancing the efficiency of lithographic processes.
Latest Patents
Johannes Schöneberg holds 1 patent for his invention titled "Method, device and computer program for repairing a mask defect." This patent describes a comprehensive method for addressing defects in masks used for lithography, especially in extreme ultraviolet (EUV) lithography. The process involves multiple steps, including initial repair, influence assessment, and subsequent repair dose determination, ensuring precision in defect management.
Career Highlights
Schöneberg is associated with Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography equipment. His work at this esteemed organization has allowed him to push the boundaries of technology and innovation in lithography.
Collaborations
Some of his notable coworkers include Christof Baur and Jens Oster. Their collaborative efforts contribute to the advancement of technologies in the lithography sector.
Conclusion
Johannes Schöneberg's contributions to the field of lithography through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile