Best, Netherlands

Johannes Roland Dassel

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johannes Roland Dassel. Retrieved from https://idiyas.com/inventor/johannes-roland-dassel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Certainly! Here is an article based on the provided data:

Title: Unveiling the Innovations of Johannes Roland Dassel in Lithographic Technology

Introduction:

Johannes Roland Dassel, a prolific inventor in the field of lithographic technology, hails from Best, Netherlands. With a keen eye for detail and a passion for precision, his work has revolutionized the way lithographic apparatus operate.

Latest Patents:

One of Dassel's standout patents is the "Lithographic apparatus and position sensor," which features a stationary magnet motor driving a support system. This innovation incorporates a measurement system designed to ensure the safe operation of the apparatus by accurately measuring the position of the support in real-time.

Career Highlights:

Currently employed at ASML Netherlands B.V., Johannes Roland Dassel has made significant contributions to the advancements in lithographic technology. His expertise and dedication have propelled him to the forefront of innovation in the industry.

Collaborations:

Dassel's collaborative spirit is evident in his work alongside esteemed colleagues such as Olaf Hubertus Wilhelmus Van Bruggen and Marcel Koenraad Marie Baggen. Together, they have pushed the boundaries of lithographic technology, setting new standards for precision and efficiency.

Conclusion:

In conclusion, Johannes Roland Dassel stands as a visionary inventor whose ingenuity has reshaped the landscape of lithographic technology. His commitment to excellence and collaborative efforts have solidified his position as a pioneer in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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