Lubbeek, Belgium

Johan F Nijs

This inventor holds 10 USPTO granted patents. Top assignees: Imec Vzw, Interuniversifair Micro-Elektronica Cenirum (Imec Vzw), Interuniversitair Micro Elektronica. Active years: 1992-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johan F Nijs. Retrieved from https://idiyas.com/inventor/johan-f-nijs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 8

Forward Citations = 425(Granted Patents)


Location History:

  • Kessel-lo, BE (1992)
  • Lubbeek, BE (1992)
  • Linden-Lubbeck, BE (2001)
  • Linden-Lubbeek, BE (1998 - 2004)

Company Filing History:


Years Active: 1992-2004

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10 patents (USPTO):Explore Patents

Title: The Innovations of Johan F. Nijs: A Pioneer in Semiconductor Technology

Introduction

Johan F. Nijs, an accomplished inventor based in Lubbeek, Belgium, holds an impressive portfolio of 10 patents in the field of semiconductor technology. His innovative contributions have significantly advanced the manufacturing processes and functionalities of semiconductor devices, making him a notable figure in the industry.

Latest Patents

Among his latest inventions is a "Semiconductor device with selectively diffused regions." This patent outlines a comprehensive method for manufacturing a semiconductor device comprising a semiconductor substrate shaped like a slice. The process involves selectively applying a solid-based dopant source to the substrate, followed by controlled heat treatment. This unique approach facilitates the formation of distinct diffusion regions within the substrate, enhancing the device's performance and reliability.

Another remarkable innovation is the "Thin-film opto-electronic device and a method of making it." This patent describes a novel thin-film opto-electronic device built on a conductive silicon-containing substrate. The architecture consists of a porous silicon layer that provides light diffusing and reflecting properties, combined with a non-porous layer. This design configuration allows for effective optical confinement, making the device ideal for advanced electronic applications.

Career Highlights

Johan F. Nijs has dedicated much of his career to renowned institutions, notably Imec and the Interuniversity Microelectronics Centre (imec). His work at these leading research organizations has enabled him to push the boundaries of semiconductor technology, contributing to several groundbreaking advancements in the field.

Collaborations

Throughout his career, Johan has collaborated with esteemed colleagues, including Jozef Szlufcik and Jörg Horzel. These partnerships have fostered an environment of innovation and creativity, allowing Johan to tackle complex challenges in semiconductor manufacturing and design.

Conclusion

Johan F. Nijs stands out as a key innovator in the semiconductor field. His 10 patents reflect his dedication and expertise in developing advanced technologies that significantly impact modern electronics. As the industry continues to evolve, the contributions of inventors like Johan will remain essential in driving future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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