This inventor holds 1 USPTO granted patent. Top assignees: Beneq Oy, The United States of America as Represented by the Department of Energy. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2015
Title: Joel W Pankow: Innovator in Moisture Barrier Technology
Introduction
Joel W Pankow is an accomplished inventor based in Littleton, Colorado. He holds a patent for a multilayer moisture barrier, showcasing his expertise in materials science and engineering. His innovative approach to moisture barriers has significant implications for various industries.
Latest Patents
Pankow's notable patent is for a multilayer moisture barrier. This invention includes a moisture barrier device or product that consists of at least a polymer layer, an interfacial layer, and a barrier layer. The polymer layer can be made from various suitable polymers, including fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), as well as ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed through atomic layer deposition (ALD), with potential materials including AlO, AlSiO, TiO, and an AlO/TiO laminate. The barrier layer, associated with the interfacial layer, can be deposited using plasma enhanced chemical vapor deposition (PECVD) and may consist of a SiON film.
Career Highlights
Throughout his career, Pankow has worked with notable organizations, including Beneq Oy and the U.S. Department of Energy. His experience in these institutions has contributed to his development of advanced materials and technologies.
Collaborations
Pankow has collaborated with esteemed colleagues such as Gary J Jorgensen and Kent M Terwilliger. These partnerships have likely enhanced his research and innovation efforts in the field of moisture barrier technology.
Conclusion
Joel W Pankow is a significant figure in the realm of moisture barrier innovation, with a patent that reflects his dedication to advancing material science. His contributions continue to influence various applications and industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile