Laubach, Germany

Jochen Ritter


Average Co-Inventor Count = 3.3

ph-index = 6

Forward Citations = 146(Granted Patents)


Company Filing History:


Years Active: 1990-1996

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8 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Jochen Ritter in Plasma Technology

Introduction

Jochen Ritter, an accomplished inventor based in Laubach, Germany, has made significant strides in the field of plasma technology. With a remarkable portfolio of 8 patents, he has dedicated his career to advancing methods for coating and etching substrates, showcasing his expertise and innovative mindset.

Latest Patents

Ritter's latest patents highlight his cutting-edge contributions to the industry. One of his notable inventions is an "Arrangement for coating or etching substrates." This invention introduces an innovative method for generating a high-frequency (HF) substrate bias voltage without contact. The design incorporates plasma sources equipped with a bias pot located at a specific distance from the substrate carrier, which is energized by HF. This technology allows for precise control over the dc potential on the carrier, enabling specific ion bombardment on the substrate.

Another of his significant works is an "Arrangement for coating substrates," which involves an electrode configuration for a plasma-generating device. In this invention, RF power is coupled contactlessly through a capacitive coupling electrode placed at a distance from the carrier’s backside within a coating installation. The presence of dark space shields on the coating side defines the plasma zone, preventing unwanted parasitic plasmas while achieving an HF substrate bias voltage on the moving substrate carrier.

Career Highlights

Throughout his career at Leybold Aktiengesellschaft, Jochen Ritter has focused on pushing the boundaries of technology in the coating industry. His dedicated work has not only resulted in multiple patents but also positioned him as a leading figure in the development of advanced plasma technologies.

Collaborations

Ritter's journey has seen him collaborate with several prominent professionals in the field, including Rainer Gegenwart and Manfred Arnold. These collaborations have fostered an environment of innovation and have enabled the development of groundbreaking technologies that enhance the capabilities of plasma applications.

Conclusion

Jochen Ritter's inventiveness and dedication to advancing plasma technology exemplify the spirit of innovation. With his impressive patent portfolio and collaborative efforts, he continues to contribute significantly to the industry, ensuring that the future of coating and etching substrates is bright and full of possibilities.

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