The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 1995

Filed:

Jan. 10, 1994
Applicant:
Inventors:

Manfred Arnold, Meckenbeuren, DE;

Guido Blang, Nauheim, DE;

Rainer Gegenwart, Rodermark, DE;

Klaus Michael, Gelnhausen, DE;

Michael Scherer, Rodenbach, DE;

Jochen Ritter, Laubach, DE;

Oliver Burkhardt, Hanau, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429811 ; 20429807 ; 20429823 ; 20429825 ; 20429835 ; 118718 ; 118719 ; 1187 / ; 118729 ;
Abstract

The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.


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