Location History:
- Roedermark, DE (1992 - 1993)
- Rodermark, DE (1990 - 1996)
Company Filing History:
Years Active: 1990-1996
Title: Rainer Gegenwart: Innovator in Plasma Technology
Introduction
Rainer Gegenwart is a notable inventor based in Rodermark, Germany. He has made significant contributions to the field of plasma technology, holding a total of nine patents. His work focuses on innovative arrangements for coating and etching substrates, which are essential processes in various manufacturing industries.
Latest Patents
Gegenwart's latest patents include an "Arrangement for Coating or Etching Substrates." This invention relates to a system that generates a high-frequency (HF) substrate bias voltage without contact. The arrangement utilizes plasma sources equipped with a bias pot, which is strategically positioned at a dark space distance from a substrate carrier and is activated by HF. This design allows for precise control over the ion bombardment on the substrate, enhancing the coating process.
Another significant patent is the "Arrangement for Coating Substrates." This invention features an electrode configuration for a device that generates plasma. In this setup, RF is coupled contactlessly through a capacitive coupling electrode located at the dark space distance into the backside of a coating installation. The dark space shields on the coating side define the plasma zone and prevent the formation of unwanted parasitic plasmas, ensuring a more efficient coating process.
Career Highlights
Gegenwart is currently associated with Leybold Aktiengesellschaft, a company known for its advanced vacuum technology and coating solutions. His expertise in plasma technology has positioned him as a key player in the development of innovative solutions for substrate coating and etching.
Collaborations
Throughout his career, Rainer Gegenwart has collaborated with notable colleagues, including Jochen Ritter and Helmut Stoll. These partnerships have contributed to the advancement of technologies in the field of plasma applications.
Conclusion
Rainer Gegenwart's contributions to plasma technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of substrate coating and etching processes.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.